Ingcebiso yeMveliso | Ilensi ye-F-theta ene-Triple Wavelength Achromatic
Iilensi zokuskena zelaser eziqhelekileyo zihlala zenzelwe ubude obude obunye—ukutshintshela kwilaser eyahlukileyo kubangela ukujika kwe-focal, amabala afipheleyo, kunye nokuphawula okufipheleyo. Iilensi zokuskena ze-dual-band zinokulungisa kuphela ukuguquguquka kwe-chromatic phakathi kwamaza amabini.
Ilensi ye-3-Wavelength Achromatic Scan yilensi ekhethekileyo yokugxila ekuskeni ephelisa ukuguquguquka kwe-chromatic kwiiwavelength ezintathu ezahlukeneyo ze-laser. Zonke iiwavelength ezintathu zineseti efanayo ye-optical; ukutshintsha phakathi kweenkqubo kufuna ukutshintsha umthombo we-laser, ngaphandle kwemfuneko yokuyiqhekeza okanye ukuyiphinda uyifake. Oku kuyenza ifaneleke kwiinkqubo zokucubungula ezihlanganisiweyo zeenkqubo ezininzi.
Eyona nhlanganisela ixhaphakileyo ye-industrial wavelength: 355 nm (UV), 532 nm (green), kunye ne-1064 nm (IR).
Iingenelo zeNdleko yoBuchule bokuSebenza
1. Ulungelelwaniso lweParfocal Three-Wavelength kunye nomgangatho weSpot ohambelanayo
Ukulungiswa kwe-chromatic aberration ngaxeshanye kwi-355/532/1064 nm (okanye i-RGB eyenziwe ngokwezifiso, ukuhlanganiswa kwebhendi ye-UV-VIS-SWIR). Iiplani ze-focal zazo zonke ii-wavelengths ezintathu ziyahambelana, ziqinisekisa ukujikeleza kwebala okulinganayo kulo lonke icandelo lokuskena, ngaphandle kokuphazamiseka kwe-axial defocus okanye i-edge chromatic.
2.Ubuchule obuphezulu bokuQhuba okuDibeneyo kunye neMpazamo yokuBeka indawo encinci
Ukongeza kwi-chromatic aberration, i-field curvature, i-distortion, i-spherical aberration, kunye ne-coma nazo ziphuculiwe. Ukuchaneka okuphezulu kwe-f-theta scanning kwenza ukuba kukhethwe ubude be-wavelength ngokusekelwe kwiimfuno ezithile zomsebenzi. Ukucutshungulwa kweenxalenye ezidityanisiweyo ze-multi-wavelength kuphucula kakhulu ukuchaneka kokucubungula ngokubanzi.
3. Ukujikeleza okuphantsi kwentsimi kunye nokufana okugqwesileyo kweendawo ezigcweleyo
Imizekelo yesicelo
I-343 nm yokususa izinto eziphilayo ezifana ne-photoresist; i-515 nm yokususa isinyithi okanye i-polysilicon kwiileya ze-passivation; kunye ne-1030 nm yokususa i-ITO kwiileya ze-passivation. Ilungele ukulungiswa kwephaneli kunye nokusetyenziswa kovavanyo.
Iiparamitha zeMveliso：
| Ubude bamaza | 1030nm kunye ne-515nm kunye ne-343nm |
| Ububanzi beBeam yokufaka | 10mm |
| Ubude beFocal esebenzayo (EFL) | 250mm |
| Ubungakanani beNdawo yoGxilo | 46.94–46.97μm @ 1030nm23.62–23.76μm @ 515nm15.69–16.37μm @ 343nm |
| Intsimi yokuSkena | 17×17mm |
| Umgama Wokusebenza (WD) | 224.5mm |
| Ubude obupheleleyo belensi | 46mm |
| Ububanzi obungaphandle beLens | Φ82mm |
| Ugobile lwentsimi | <0.1mm |
| Uphazanyiso | <0.1% |
Uyilo olulungiselelwe wena lufumaneka ngokweemfuno zokwenyani.
Ixesha leposi: Julayi-08-2026